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- Scanning Electron Microscopy Facilities
Scanning electron microscopy (SEM) is an imaging technique that generates secondary sample irradiance using incoming electrons. It can then be detected in a variety of ways, including using a high depth of focus and a lateral resolution of around 1-20 nm to view the sample surface and assess the substrate's physical and chemical status.
Scanning electron microscopy applications include: morphological and topographic imaging; combined contrast imaging; chemical analysis by energy or wavelength dispersive X-ray spectroscopy (EDS, WDS); dynamic macroscopic, microscopic, and nanostructure imaging under temperature, pressure, and strain changes.
FIBSEM - It combines a typical SEM with a focused ion beam that can be used for material processing and sample preparation (deposition, ablation, sectioning, and so on) as well as independent imaging at low beam current.
ESEM - It allows imaging of poorly conducting "uncoated" or "wet" samples that can't be scanned in typical SEMs due to the high vacuum conditions.
Cryo-SEM - It enables quick freezing, biological sample preparation, and SEM imaging. By limiting water loss during vacuum operation, the completely hydrated sample retains its original substrate form and chemical properties.
FEGSEM - It generates an electron beam with a smaller diameter than a normal thermal emission source by using a field emission gun electron source. This can improve spatial resolution and make the approach more suitable for the characterization of nanostructures.
The small electron beam scans the sample's surface in lockstep with the light spot of the cathode ray tube. Electrons scatter elastically and inelastically as a result of the incident beam, as well as variations in electromagnetic radiation. Secondary electrons, backscattered electrons, Auger electrons, cathodoluminescence, and X-rays are among the secondary signals that can be detected.
The strength of the secondary signal will change depending on the physical state, chemical characteristics, surface shape, and other factors when the primary electron beam is rasterized on the substrate. The contrast can be viewed by altering the brightness of the cathode ray tube's point using the amplified version of the detection signal.
Carl Zeiss Sigma 300 Field Emission Scanning Electron Microscope
The device combines sophisticated analytical performance with field emission scanning technology, as well as mature Gemini electronic optical components for particle, surface, and nanostructure imaging. Any sample can have accurate and repeatable analytical results at any time.
JEOL JSM-7610F Scanning Electron Microscope
This is a half-lens objective Schottky field emission scanning electron microscope with ultra-high resolution. High-throughput and high-performance analyses are possible with high-power optical devices. It can also be used for high-resolution analysis. In addition, the soft beam mode can limit incident electron penetration into the material and observe the top surface using hundreds of landing energies.
The device combines two well-established technologies: an electron column with a half-lens objective lens that can give high-resolution imaging at low acceleration voltage, and an intra-lens Schottky FEG that can deliver a steady big probe current. This results in ultra-high resolution and a wide range of probe currents (from a few pA to over 200 nA) that are appropriate for a wide range of applications.
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